Inamori School of Engineering

Thick-film Processing Facilities and Pilot Plant
McMahon Bldg., 2nd Floor

A suite of equipment is available for the laboratory-scale preparation of thick-film ceramics. Tape-casting slurries are prepared using a variety of mixers, blenders, and sonicators. Screen-printing pastes are prepared with an Exact three-roll mill. A Thinky blender is the latest acquisition. Manual casters and printers are available for making samples up to 6 inches wide. A full turn-key KEKO MLC line will be available in a class 10,000 clean room by fall 2007. This line is available for internal and external use. Single-sample firing is accomplished in a number of smaller programmable furnaces (some atmosphere controlled). Larger number of samples are fired in a 4" belt kiln. A fast-fire furnace allows control of heating/cooling profile of small specimens at rates of up to 1000 K/min (1600°C, maximum temperature).

If necessary, processing can be accomplished in our second Class 10,000 clean room with a Class 100 Micro environment. This room also houses dip and spin coating equipment as well as a silica tube 1200C furnace in an exhausting hood.

The Nanotechnology Pilot Plant, located in Ceramic Corridor Innovation Center, includes nearly 500 square feet of a Class 10,000 clean room environment, a suite of Keko manufacturing equipment for making multilayer ceramics, and microwave sintering equipment.

The facility was funded by a $ 1.8 M grant made to the Center for Advanced Ceramic Technology (CACT) by the NYS Office of Science, Technology and Academic Research (NYSTAR). In collaboration with colleagues at Clarkson University and industry partners, researchers at Alfred University will use the facility to consolidate nanosized ceramic powders into multi-layer and monolithic ceramics, while retaining the enhanced properties associated with nanostructured materials.


For more information about thick-film research Dr. Walter Schulze.

For student training or equipment maintenance, please contact Fran Williams.