Film Processing Facilities
Equipment is available for preparing thin films using high-vacuum and solution-based methods. High-vacuum equipment includes a magnetron sputter-deposition system (DC, pulsed DC, and RF) and an ion-assisted electron-beam deposition system. This equipment used for depositing a variety of oxides, nitrides and metals. Spin-coating and dip-coating systems are available for depositing oxide and polymer coatings using solution-based methods.
For more information about high-vacuum thin-film deposition capabilities, contact Dr. Xingwu Wang.
For more information about spin-coating and dip-coating equipment, contact Dr. Xingwu Wang.